Study On Forming Process Of Ultr Athin Light Guide Plate By Isothermal Hot Embossing

With the rapid development of liquid crystal display in the field of electronic technology,the forming technology of light guide plate has become a research hotspot nowadays.Based on isothermal hot embossing technology,we explored the process of forming ultra thin light guide plate and optimized the process.First,the whole process and process principle of the isothermal plate hot embossing technology are analyzed,and compared with the traditional imprint method,it is found that this method can greatly improve the forming efficiency and shorten the forming time.Based on the double-sided microstructural light guide plate,an upper and lower die differential temperature imprinting method is proposed.The imprint temperature of the upper and lower templates is different,the lower die temperature is lower than the upper die,which avoids the formation of the bubbles and so on.At the same time,the imprinting efficiency is also improved.Combining this method with isothermal embossing,high efficiency and high quality imprint can be achieved.In order to achieve the purpose of optical testing of light guide plate,a backlight experimental platform is built,and an ultra thin light guide plate testing equipment with light source is assembled to observe and detect the light guide effect of the experimental sample.The whole stamping process of the ultra-thin light guide plate with thickness of 0.25mm is simulated by finite element method.The mold filling effect of the micro structure on the light guide plate under different process parameters is shown by simulation,and the optimum parameters of the process parameters are obtained,that is,the temperature of the upper template is 113,the temperature of the lower template is 100,and the pressure is 11Mpa.Finally,the simulation results are basically consistent with the actual operation.In view of the difficult machining of ultra-thin guide plate die,a new compensation embossing method is put forward,which can make up the shortcoming of too large micro structure by reducing the value of process parameters.In combination with the isothermal plate hot press printing,it is found that the entire imprint process is fully in accordance with the requirements of the isothermal imprinting method.In contrast,the imprinting efficiency can be further improved on the original basis.The experiment is set up from the angle of different process parameters,and the feasibility of compensating embossing is verified.It is found that the whole imprint process is only 20s,and the uniformity is increased by 23 percentage points on the original basis.Several defects produced by light guide plate under the condition of improper setting of process parameters are analyzed,and measures for reducing and avoiding all kinds of defects are provided.The effect of different materials and different die processing methods on the quality of light guide plate is discussed.Through the concrete experiments,it is found that the PMMA guide plate has better guide quality than the PC light guide plate.The collision point method is more beneficial to the processing of the ultrathin guide plate microstructure die than the laser cauterization method.The influence of the size of microstructures on the light guide plate on the quality of light guide is analyzed.Four sets of experiments were set up to explore the relationship between them.It was found that the smaller the thickness of the light guide plate,the smaller the required microstructural size.