Research On Processing Technology Of Three-dimensional Submicron Structures Using A Direct Laser Writing System

Through the two-photon polymerization effect,photoresist can be crosslinked by controlling laser's power and position with a laser writing system.Theoretically,any kinds of submicron structures can be processed in this way.At present,people mainly use an expensive femtosecond lasers to process submicron structures,which is harmful to the promotion of this technology.In this thesis,we introduced a new laser writing system which was established with a continuous wave laser at 532 nm.After a quick review of system and the processing principles,studied the processing technology with lots of experiments,finally came up with a new processing technology and verified process reliability from submicron structures processing.The main work of the thesis includes the following aspects.(1)Research on the process of the system.Firstly,the exposure principle of photoresist and influencing factors of two-photon polymerization are introduced.Then,the process of system and photoresist is studied,including the process of laser adjusting,the process of photoresist coating and developing,et al.(2)Research on the expose parameters.The height of the structures is studied by experimental methods.And the resolution of system is studied by changing process parameters such as the power or scan speed of laser.Besides,a quick summarizes of common problems is gived.Finally,using the parameters after being optimized,lots of three-dimensional submicron stuctures such as piles,helixs,spheres is being processed.