| Nowadays,the product of integrated circuit has been widely used.Short for Physical Vapor Deposition,the PVD equipment is one of the major facilities of production line in the field of integrated circuit.Two key indicators for the performance of PVD equipment are as follows:utilization ratio of the target and uniformity of the film.However,those two key indicators are directly affected by rotation of the magnetron.Hence,how to control the rotation of the magnetron is not only a vital topic but also the reflection of the sci-tech power.The PLC and motor drivers have direct control over rotation of the magnetron,which affects the speed and accuracy.Trajectory equation and interpolation algorithm are the core of the control of the rotating magnetron,which affects the matching rate of trajectory and error correction.So it is very important to choose the appropriate algorithm.Based on the difficulties we mentioned above,this paper proposes a method to improve ionization rate of the target and uniformity of the film through the in-depth analysis and research.Firstly,this paper explains the principle of the trajectory equation and the interpolation algorithm,which provides a theoretical basis for the realization of the system.Secondly,the framework of the control system is introduced,with emphasis on the design of hardware,wire connection and control program.As for the control program design,this paper focuses on the development environment,the origin searching,the interpolation algorithm and the alarm processing include the software architecture.Finally,Matlab is used to simulate the trajectory of the magnetron.And the method is also applied to the test platform.In that platform,the transceiving of data profile and graphic of the trajectory is realized.And the utilization rate of the target is increased from 24.8%to 55.1%and the uniformity of the film is improved from 14.13%to 5.66%.Based on those data,the result is proved to meet the technical requirements. |
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