Research On Surface Plasmons Superresolution Nanolithography Technique

Lithography,as one of the important technologies in the fabrication of integrated circuits(IC)and micro-electromechanical systems(MEMS),cannot break through the Rayleigh diffraction limit due to the influence of optical diffraction,which limited the further promotion of resolution and development of IC and MEMS.In recent years,many novel super-resolution lithography techniques were proposed to overcome such problem,among which the surface plasmons(SPs)lithography attracts the much attention by virtue of the loose experimental condition and well performance.Herein,this dissertation discusses experimentally and theoretically,studies the mechanism and approaches of this super-resolution lithography techniques.The main contents of this dissertation are summarized as follows:1.The development history of lithography technology is introduced,and then the advantages and disadvantages of traditional lithography technology are discussed.Based on this,we noted the inevitability of super-resolution lithography techniques and proposed the surface plasmons lithography technology based on polydimethylsiloxane(PDMS)soft mold.2.Based on the relative principal theories and research methods,the physical mechanism of edging and coupling effects in the proposed lithography is analyzed and discussed.3.By the use of FDTD software,we built two models on traditional and SPs edging effects,and further obtained their electrical distributions.Comparing their electrical distributions,the lithography based on SPs edging effect has higher resolution and contrast,and is able to realize the superresolution imaging.After the structural optimization,the higher resolution could be obtained.The experimental results show that this lithography could be used to make the lithography pattern with feature size less than 2?m with the mask structure of 18?m linewidth.4.With the FDTD,we built two models on traditional and SPs light coupling effects,and further obtained their electrical distributions.Comparing their electrical distributions,the lithography based on SPs light coupling effect has an advantage on resolution,contrast and propagation depth.After the structural optimization,the superresolution imaging with the feature size of ?/ 10 and the contrast of up to 0.99 could be realized,which solves the problem of accurate and complex-structure imagings.