Synchrotron Radiation Research Of Metal Nanoparticles Fabricated By Ion Implantation

In this paper,we illustrate the significant value of ion implantation in the field of semiconductor,and use it to fabricate single metal nanoparticles and bimetallic nanoparticles by controlling the concentrations,injecting elements and doping ratio.Based on the introduction of the working principle of the testing technology,we used UV-vis spectrum,atomic force microscopy,and synchrotron radiation fluorescence XAFS to study the doped materials under different injection parameters.And through the testing,we observed the optical absorption,surface morphology and local microstructure of the samples.Meanwhile,the crystal structure database,FEFF calculation and the use of IFEFFIT software are introduced and summarized in detail for the data processing of fluorescent XAFS.Through the test and analysis,the oscillation signal and the fine structure information of the injection element are obtained,including the composition of the nearest neighbor elements,the coordination number,the atomic distance,and so on.The optical properties of doped materials were tested by UV-vis fluorescence spectrum and synchrotron radiation vacuum ultraviolet fluorescence spectroscopy.Based on the analysis above,we found the change law of the local microstructure and optical properties of the doped materials,so as to provide a scientific basis for the production and application of this kind of materials in the semiconductor doping process.