Study On The Fabrication Of Curved Micro-lens Array Using Point By Point Optimized Mask Design

Curved micro-lens array has Large field of view,high sensitivity for dynamic objects capture,flexible freedom of design.Therefore,it has been used as the important position in National defense science and technology,modern industry,aerospace field.At present,domestic and international existing curved micro lens array fabrication technology have disadvantages such as long cycle high cost,low efficiency and industrial limited because the fabrication techniques for curved micro-lens array mainly point by point processing production.This dissertation fabricated curved micro-lens array in the plane through the mask of different gray values and SLM Control exposure dose based on digital mask lithography.The mapping relation of digital mask,exposure dose,the fabrication depth are deeply studied.The digital mask lithography for curved micro-lens array is proposed.Compared with the existing fabrication techniques,The digital mask lithography for curved micro-lens array is a fast technique,which has the advantages including the shorter cycle,lower cost and higher efficiency.It has good prospect and widely application in industrial application and industrialization of production,has a wide application in modern micro-nano processing fields.The main content of this dissertation are as follows:1.A method for fabricating curved micro-lens array using the digital mask lithography is studied.The method using SLM Control exposure dose of each pixel to approximately express the profile of curved micro-lens array.2.A novel mask design for fabricating curved micro-lens array using point by point optimization is proposed to break through the restriction of integral algorithm design mask.Then the method is studied on system,mechanism and mask design.Finally curved micro-lens array is fabricated in the experiment and compared with the design outline,the experimental results proves that the mask design using point by point optimization is feasible.3.The curved splicing digital mask lithography for the fabrication of large-area curved micro-lens array is studied to break through the restriction of fabrication area.Then,The curved splicing digital mask lithograph is discussed on the principle of splicing,the design of mask and the experimental problems.Finally,large-area curved micro-lens array is fabricated in the experiment and compared with the design outline,the experimental results proves that curved splicing digital mask lithography for the fabrication of large-area curved micro-lens array is feasible.