| It is one of the current research hotspots to utilize MEMS (Micro-Electro-Mechanical System) technology to fabricate micro-lens array. The micro-lens array was obtained to use fixed lithography based on a circular mask and to combine with a hot melt process in the traditional UV lithography technology. Although this method for fabricating micro-lens array was simple, but the obtained micro-lens profile was single. Based on the analysis and summarization of the current micro-lens array preparation methods, a novel micro-lens array preparation method based on twice X-ray moving lithography and molding technology was proposed in this research. The twice moving X-ray lithography technology, that is, after the first X-ray exposure, the mask was rotated by 90° and the second X-ray exposure was carried out. And the photoresist development simulation prediction model and algorithm with omni-directional etching were established by introducing lateral etching mechanism. The internal relations of the relevant parameters were analyzed, and the simulation prediction program based on C language was prepared. Moreover, the microlens profile was predicted.In this research, a PMMA (polymethylmethacrylate) micro-lens array mold was fabricated by using semi-circular mask and the twice moving X-ray lithography technology.Then, the epoxy resin micro-lens array was obtained by using PDMS (polydimethylsiloxane)molding technology. And the profile of the epoxy resin micro-lens was measured, the results showed that the new method for the fabrication of micro-lens array was proved to be feasible.Finally, the simulation prediction results were compared with the experimental results, and the simulation error development was 5% in the depth of the photoresist. Therefore, the simulation prediction model could be used to predict the profile of micro-lens based on the twice moving X-ray lithography technology. The reference to the improvement of the microlens would be provided. |
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