Research On The Preparation Method Of Thin Film Of Infrared Photonic Crystal Based On The Holographic Lithography

As a new type of artificial electromagnetic dielectricmaterial, photonic crystalhas excellent performances and wide application potential. In recent years, many domestic and foreign deep researches of photonic crystals, especially for one and two dimensional photonic crystal, are proposed. However, the preparation process and research results of three dimensional photonic crystal are relatively rarely presented. It can be said that photonic crystal has become a research hotspot in the field of optics.This paper investigates on the preparation of flexible photonic crystal thin film,which mainly by laser hologram technique and combined with lithography technique of contact exposure, laser holographic lithography, embossing technology and stacking technique as well.The main work of this paper arelisted as follows:1.The concept, structure, properties and preparation method of photonic crystals are elaborated comprehensively.The correlated theory of the laser holographic lithography for preparing photonic crystal is especially introduced, and the principle of photoresist and its practical application are emphatically described.Meanwhile, the research progress of laser holographic lithography is introduced as well. The main works of the second and third chapter are to provide a solid theoretical basis for the following experiments.2.According to the theoretical knowledge presented in the first half of paper,combining with the PVC contact photolithography, laser holographic lithographybased on chromium plateand PDMS transfer printing technology, a platform for the preparation of thin film of two-dimensional photonic crystal film is build and successfullyprepared the two dimensional photonic crystal films with soft properties on it. What`s more,thepreparation of three dimensionalphotonic crystal film is conducted using embossing technology and stacking technology.3.By using digital microscope and light of laser wavelengths ofinfraredsemiconductor,the observation and inspection of two dimensional and three dimensional photonic crystals are finished, which further proof the feasibility of four kinds of method for preparation of photonic crystals. At the end of this paper, the workof the whole paper is summarized.