65nm NOR Flash Integrate Technology Reseach

In 1984, Toshiba Co inventor Fujio Masuoka put forward the concept of flash memory. In 1988, Intel first developed the NOR Flash technology, The flash memory with low power consumption, fast read and fast write, large capacity, low cost advantages,NOR and NAND is currently two major flash memory products on the market. It is widely used in all kinds of embedded system. Along with the consumer requirement for the product size is more and more small, function is stronger and more. To speed up the development of chip integration technology. Driven by the rapid growth of non volatile memory NOR Flash memory chip with floating gate structure.All along, the development of semiconductor integrated circuits has followed the famous Moore law. The number of transistors in silicon chips, every 18 months would turn over one times.Size of microelectronic devices is in proportion in a narrow, it drives the electronic equipment to the direction of miniaturization. At present, the industry of non-volatile semiconductor memory development trend is mainly focus on two aspects, one is the new mechanism, application, research and development of new materials and new structure and new storage technology; on the other hand, Flash storage technology continue to develop and improve the development of the mainstream, as far as possible to the smaller nodes forward.NOR Flash now has entered the age of technology node of 45nm NOR Flash,65nm NOR Flash mass production has become the urgent needs of the market now. For the manufacturing industry, mass production has many challenges; the yield rate needs to continuously improve the process to achieve the maximum potential. This paper selected 65 nm NOR Flash technology, the integration process studied.This thesis is divided into five chapters. At first, the development and current situation of memory is introduced. Then the NOR flash structure and working principle as well as 65nm Flash encountered in the production process are described. In addition, the 65nm NOR Flash process problem and its source are analyzed. At last, adjusting and improving process of the product, quality and reliability are improved. It’s benefit to the realization of large-scale production. In the end of the thesis, the conclusion and prospect for the future are summarized.