Study On Nano Modification Of Implantable Flexible Neural Microelectrode

Implantable neural microsystem is widely used in many fields, such as brain computer interface(BCI), neural prosthesis, etc. As a significant tool of implantable neural microsystem, it helps people to understand neural system deeply and treat neural system diseases better. Implantable neural microelectrode acts as a connecting part between outside system and neural system. So, with the development of neuroscience and medical science, the application of the implantable microelectrode becomes wider and wider and higher quality is required. This paper studies the design, microfabrication modification and testing of the implantable flexible neural microelectrode with different specifications. Then, this paper studies metal to Parylene adhesion enhancement. Last, this paper studies modification materials by using RIE as to improve electrical property and biocompatibility of microelectrode.The research results and innovative results are outlined as follows.According to the animal experiments demand, 7 kinds of different specifications microelectrodes or microelectrode array are designed. With the process developed by our groups and multiple project wafers, 500 microelectrodes can be made from one 4 inch silicon wafer.The researches on the batch modification of the microelectrode were developed. With the RIE modification, the adhesion of the microelectrode can be improved. RIE can batch modify the microelectrode and be compatible with the microelectrode process. By optimizing the oxygen flow, the working pressure and the working time, the adhesion of the microelectrode could be improving a level.The rasing demand of higher recording density and smaller recording size accompany with high impedance are adverse to recording and stimulation. Modification materials by using RIE on recording sites were tried to improve electrical property and biocompatibility of microelectrode. After modification, the impedance of microelectrode can be brought down by two orders of magnitude, while the charge injection limit can be increased by two orders of magnitude compared with bare recording site.