Vibration Attenuation Analysis Of Compressional Gas Cushion Press Nanoimprint Lithography System

The semiconductor integrated circuit has been widely applied in various fields ofsociety. Integration level has been improved gradually along the Moore’s Law, andminimal feature size is decreasing sharply. With the increasing demand for highintegration electron devices, the traditional optics lithography is unable to meet therequirement of higher integrated circuit due to its disadvantages of complicatedprocesses, low output, limited precision. Nanoimprint lithography coming into beingin1995, has been received extensive attentions. It has been included in ITRS2005asone of Next Generation Lithography for16nm node and the highest resolution isunder5nm.Nanoimprint lithography has ability to transfer nano-size patterns. Researchesfocuses on improving Nanoimprint lithography equipment accuracy and extendingthe application fields. This paper firstly presents the three basic technology ofNanoimprint lithography and various modified technologies, and then analyzes meritsand demerits of all mentioned technologies.After analyzing new requirements for equipment accuracy of Nanoimprintlithography, an adjustable self-lubricated piston structure is presented, whichdecreases the influence of cylinder inner diameter’s homogeneity on pistonperformances. PTFE is employed as the material of piston rings to avert oilcontamination, and coefficient of friction is under0.01. Hertz contact theory analyzesand deduce the press between piston rings and cylinder wall. Simulation withCOMSOL Multphysics is taken on adjustable self-lubricated piston and traditionalpiston to obtain the amplitude-frequency of cylinder wall vibration, which is theguidance of vibration attenuation. The simulation results shows that amplitude causedby adjustable self-lubricated piston is less than the one caused by traditional piston,which is conducive to lengthen service life of piston rings. After analyzing theprocess of vibration lateral transmission in compressional gas cushion pressnanoimprint lithography system, a passive vibration attenuation device is employed to reduce the influence of vibration on pattern transfer precision. Based on the geometricdimensioning of compressional gas cushion press nanoimprint lithography system,modeling the passive vibration attenuation conduce to analyze the transmissionmechanism. Material parameters of vibration attenuation ring are deduced byelastodynamics. It demonstrates that Young’s modulus of a perfect material ofattenuation ring should be smaller than8MPa and Poisson’s ratio should be close to0.5. While material density has little influence on vibration attenuation. Aftercomparing with other solid material, natural rubber is employed as the material ofattenuation ring. Research on physical internal structures of attenuation ring showsthat the nested rectangular internal structure has the best vibration attenuation. Basedon vibration source and system structure, damping vibration system is used to reducethe influence of vibration caused by servomotor and piston’s movement. Materialmechanics analysis manifest that the optimal material is natural rubber, andSimulation results show that honeycomb damping vibration cushion with threeoptimal unit layers can attenuate87.51%of the maximum amplitude. Dampingvibration system can lower the vibration source impact on fidelity.