Research On Atmospheric Plasma Machining With Determinstic Removal Method

With the development of semi-conductor industry and optical engineering, needfor ultra-smooth surface made of silicon-based materials is growing. Since thesilicon-based materials are usually difficult to manufacture and the demand forsurface shape is complicated, the existing conventional manufacturing methods arequite challenged. The widely used machining methods are mostly contact method,which not only damage the surface crystal lattice leaving residual stress andsub-surface damage, but also have difficulties in the balance between removal rateand precision. As a result, the atmospheric plasma machining technique has beenbrought in sight as a promising method.Thus, in order to meet the mentioned expectation above with atmospheric plasmamachining, research has been carried out on several key issues of this technique. Atfirst, the atmospheric plasma jet machining experiment platform was built and thestructure of plasma generator was redesigned and modified. Then, process parameterexperiments was designed, conducted and analyzed in interest of increasing removalrate and avoiding deposition. Afterwards, a simplified chemistry reaction model wasbuilt to explain the phenomenon found in the experiments theoretically so as to giveinstructions for process parameter selection. At last, a de-convolution algorithm wasselected and programmed to realize determined machining by atmospheric plasma jetmachining with computer controlled surface method.This study has positive meanings for improving the atmospheric plasmamachining capability， expanding the theory study and realizing damage-freemachining of ultra-smooth surface.