Fabrication Of Transparent Conductive ZnO Thin Film And Its SPP Modulator Research

Transparent conductive ZnO film not only has good conductivity and high opticaltransmittance in the visible region, but also can serve as high-quality plasmonic materials attelecom wavelengths or in the near IR. Compared with the conventional metals, transparentconductive ZnO film offer many advantages in the growing field of plasmonics materials,including low intrinsic loss, compatibility with standard nanofabrication processes, tunability.This paper is focused on the pulsed laser deposition (PLD) process methods to achievetransparent conductive ZnO film. The thin film structure, optical and electrical performancehas been investigated. Based on the experience the simulation of surface plasmonpolariton(SPP) modulator has also been done. The main contents of the paper are as follows,(1)The Ga-doped and (Ga, Co)-codoped ZnO films were grown on quartz glasssubstrate by PLD. By means of optimization of process parameters through X-ray diffraction(XRD) instrument, ultraviolet visible light spectrometer (UV-Vis), high epitaxy ZnO thinfilm has been achieved.(2)The optical characterization of the film was performed using a spectroscopicellipsometer. The dielectric function in the near IR was retrieved by fitting a Drude oscillatormodel to the ellipsometry data. Through the hall tester measure, the maximum carrierconcentration of the film is5.04×1020cm-3.(3)Using transparent conductive ZnO film as the metal layer in metal-insulator-metal(MIM) structure of the SPP modulator, the performance of the modulator has beenanalysised by COMSOL software simulation.