By Pulsed Laser Deposition Of Zno Thin Films And Luminescence Characteristics

Field emission display (FED) is given much attention by many researchers for its advantages such as high luminance, thin structure, low power consumption, and high visual property. To make high quality FED, not only superior cathode but also matching fluorescent anode and high sealed vacuum technique are needed. However, conventional powder phosphor screens can not meet with the operating conditions in FED.Zinc oxide thin films were prepared by pulsed laser deposition (PLD )on glass substrates coated with tin-doped indium oxide (ITO) thin films in this paper. It introduces the principle, the constitution and the operation steps. In order to optimize the thin film, the experiment was done with the different substrates temperature, the different ambience of the reaction, the anneal after deposition and the assistant of RF. X-ray diffraction (XRD), atom force microscope (AFM), scan electron microscope (SEM), photoluminescence (PL) and electroluminescence (EL) were employed to characterize their structure, morphology and luminescence. The results were discussed. The relations between the luminescence of zinc oxide thin film and their character including crystal structure, composition, the intrinsic defect, etc were investigated. It suggested that high crystal quality with strong orientation is important for influence the spectrum of the ZnO thin film. With the increase temperature of the substrates, the added argon in the ambience of the reaction and the anneal after deposition, the crystal structure was better and the diffraction peak of the (002) surface was more strong. Furthermore, the intensity of the luminescence was improved and the spectral lines were transferred to the long-wave. There were other spectral lines which were occured due to the effect of a large number of structure defects such as dislocation, grain boundary and so on in the luminescence...