| Lithography is the key equipment in LSI production, and its performancedirectly affects the integrated chip design and applications. With lithography linewidth continuously decreases and production efficiency improves, the controlsystem for wafer stage and reticle stage have become demanded. This paper hasdesigned a motion controller based on the reticle stage control system usingdedicated motion control card, set up a one-dimensional motion control platform,and the reticle stage motion control was tested.First, the current situation of lithography research was analyzed, and motioncontrol card and control strategy for the reticle stage has been researched. As toreticle stage, the force of macro stage and micro stage was analyzed, the motordecoupled analysis was determined, and solved the relationship of the forces,determined the control strategy using disturbance observer and feed-forwardcompensation control, added friction into the feedback system.Then analyzed the requirements of control card hardware and interface used inreticle stage, the whole principle of the control system architecture was raised andeach interface was described separately, and designed some experiments to verifythe various interface used in reticle stage to assure the reliability of the controlsystem.Furthermore, the control system software design was completed, including theway to communicate with PC, VG5and DSP and FPGAs in the control board. Thesystem resources that can be used to improve to simplify the operation steps, andmodular program was made. It’s easy to be called by the top-level program.Finally, the control system issue reticle stage control structure corresponding tocomplete the reticle stage control can be obtained by the experiment, thepositioning of the reticle stage noise is±3μm, resolution can reach10μm, thereticle stage can be realized sinusoidal motion, the displacement resolution is1.24nm feedback loop into the laser interferometer, the reticle stage positioningnoise reached±0.2μm. |
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