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High Quality Diamond Thin Films Deposition By Microwave Method

Posted on:2014-03-26Degree:MasterType:Thesis
Country:ChinaCandidate:H ChenFull Text:PDF
GTID:2250330401479942Subject:Materials science
Abstract/Summary:PDF Full Text Request
Diamond thin film has become a new functional and highly corrosive material in the21st century, which involves all kinds of outstanding advantages from mechanics, electricity, heat, sound and light.Very close to the natural, artificially synthesized CVD Diamond Thin Film has many advantages. Be different from the other diamond film in crystal orientation or free orientation, the diamond film with (100) orientation has superior characteristics in certain aspects because it has fewer deficiencies produced during the growth of diamond particles to the (100) orientation and it is more smooth in (100) textured films surface and it has higher thermal conductivity and lower thin film stress which is more suitable to application in heat, light and electricity, etc.There is a series of experimental research in high quality CVD diamond thin film conducted on new type MPCVD device in my thesis. The microwave frequency is2.45GHz in the MPCVD device. The maximum output power is up to10kW. We can get a plasma ball with larger volume in the reaction cavity by the overlap of the two microwave models of TM01and TM02. Thanks to10kW microwave power, high density plasma has been formed and it contributes to prepare high orientated diamond film.During the process of preparing the high orientated diamond film, we research respectively the pretreatment technology of substrate, substrate temperature, and microwave power and reaction pressure. We have mastered the inherent law of how to use the multimode cavity MPCVD device to deposit highly quality and highly oriented diamond thin film on the base of analyzing and studying how the different technological parameters effect the preparation of diamond film. We can get some rules according to the experiment:the pretreatment technology of substrate would exert a significant effect on the deposition of diamond film, and the silicon chip grinded by2500#abrasive papers would benefit to the nucleation of diamond film in the initial period and lift the rate of the nucleation and it has a better compactness. The substrate temperature would have more influences in the growth rate of diamond film,growth quality and purity,especially would influence obviously a parameter which directly influence thin films orientation. The diamond film in highly quality and highly orientation would be acquired in the deposition in the appropriate substrate temperature,and the higher microwave power would help to reduce the inner defects of diamond film,and the moderate deposition press would rise the growth rate of diamond film.On the basis of various technological parameters on the effect of high orientatied diamond film,the process parameters to deposit diamond film using the experimental device had been optimized,then the quality of diamond film is very good, the grain size is about2μm,the crystal is almost (100),the surface patten of diamond is very regular,the orientation of diamond film is (100).Through the above study, The experimental method and deposition process of depositing diamond films which have high quality and high orientation in the novel multimode resonant cavity type MPCVD device are gotten through the a series of experimental researches, which are the foundation for the deposition of high orientatied diamond films with high quality in some degree.Meanwhile, the analysis to the influence of every parameter to diamond films deposition can give theoretical direction to preparation high quality and high orientatied diamond films.
Keywords/Search Tags:novel microwave plasma, chemical vapor deposition, deposition process, high quality
PDF Full Text Request
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