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Study On Ti-TiN-TiO2Selective Absorption Films By DC Magnetron Sputtering

Posted on:2014-12-13Degree:MasterType:Thesis
Country:ChinaCandidate:X J FanFull Text:PDF
GTID:2250330401472291Subject:Condensed matter physics
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Energy is the foundation of human existence and development. Solar energy as an inexhaustible supply of new clean energy, are more and more subject to the attention of many scholars at home and abroad.In the light-heat application,the most widely used is the solar spectrum selective absorption film.This paper prepared the solar spectrum selective absorption film by magnetron sputtering based on research status,and tested the parameters.The paper selected TiO2as anti-reflection layer,Ti and TiN as absorbing layer,Al as infrared reflective layer,and had deposited monolayer TiO2, TiN and multilayer film Ti-TiN-TiO2/Al on the monocrystalline silicon and glass substrates,and analyzed its crystalline orientation, the deposition rate, surface morphology and optical properties, etc.1.TiO2filmThe experiment keeped other process parameters constant (Ar=30sccm, I=0.5A,P=0.6Pa,T=500℃,t=lh) by controlling the flow rate of oxygen(2,5,10,15sccm)prepared the TiO2thin film.The study found that the thin-film crystal orientation predominantly anatase phase (101),and the surface roughness and particle size increases with the increase of the oxygen flow rate,When the oxygen flow of5sccm generated TiO2film was smooth and dense,and400-1100nm visible-near infrared average transmission rate up to77.02%.Based on the flow rate of oxygen, we selected the oxygen flow rate was5sccm, the deposition time was4h, and changed the sputtering pressure (0.2,0.5,0.8,1.6Pa), while keeping other parameters constant prepared TiO2thin film. The study found that the crystal orientation was a single anatase(101) at the pressure of0.5Pa, and ware polycrystalline at the pressure of1.6Pa,and the deposition rate was the highest up to1.74nm/min,the film was smooth and had the smaller roughness at the pressure of0.5Pa.. Further observed the transmission spectrum found that the transmission peaks appeared interference effect and visible-near infrared transmittance reached above80%.Finally,calculated the refractive index and the width of the gap, witch closed to the theoretical value, satisfied the requirement of antireflection layer.2. TiN filmThe experiment keeped other process parameters constant (Ar=30sccm, I=0.35A,P=0.4Pa,T=350,t=2h) by controlling the flow rate of nitrogen(2,6,10,15sccm)prepared the TiN thin film.The study found that the TiN film was (111),(200) crystalline orientation, and with the N2flow increased its preferential orientation had the transition from (111) to (200).The roughness and particle size was smaller and the color was deepened with the N2flow rate increased, and the TiN film into a golden luster when the nitrogen flow was2sccm.Observed its reflectance we found that the reflectance was lower at visible band and was higher at the near-infrared band,and the reflectance decreased with N2flow increased,meanwhile the highest reflectance in the near infrared band up to67.5%when the nitrogen flow was2sccm.3.Ti-TiN-TiO2/Al multilayer filmBased on the single-layer film, we prepared Ti-TiN-TiO2/Al multilayer film by changing the absorbing layer TiN deposition time (0.5,1.0,1.5,2.0h).The study found that the multilayer film had the lowest average reflectance of12%in the300-2500nm band,and the transmittance was almost zero when the TiN deposition time was2h.Therefore,the solar spectrum selective absorption films’s absorption rate was88%and had good spectral characteristics.
Keywords/Search Tags:TiO2film, TiN film, selective absorption films, magnetron sputtering
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