Font Size: a A A

Preparation And Characteristic Of Doped Vanadium Oxide

Posted on:2014-11-04Degree:MasterType:Thesis
Country:ChinaCandidate:J D LiangFull Text:PDF
GTID:2250330401464751Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
As a high-quality optoelectronic material, vanadium oxide has shown great potentialfor semiconductor devices and optical devices. Vanadium oxide has dozens of differentcrystal phase. And in these structures, VO2and V2O5have the most concerns because oftheir scientific value and potential of application. VO2is a thermo-sensitive materialwhich has thermal phase transition properties. With the increase of temperature, thesemiconductor-to-metal phase transition will occur at approximately68°C, with anabrupt change of optical and electric properties. And because of these changes, VO2hasgreat potential for smart window, micro bolometer, information storage and so on. V2O5has good catalytic property, and it is widely used as catalyst in various electrochromicmaterials. And these years, V2O5has received much attention for it’s great potential formicro bolometer.Pure vanadium oxide material can not meet the actual demand, so vanadium oxidewas usually doped to improve it’s performance. In this dissertation, VO2/VMoOX/VO2and V2O5/Mo/V2O5thin films were deposited by DC magnetron sputtering method. Inthe experiments, The structure, TCR and optical transmission of the vanadium oxidefilms will be analyzed. The paper includes the following aspects:1. According to the solid atoms diffusion effect, the diffusion-concentration of Moatoms will be changed by altering the annealing time or the deposition time of Momiddle layer to change the microstructures, electrical and optical properties of films.Results show that the sheet resistance and phase-transition temperature was reducedeffectively and TCR of the films was increased by Mo-doping. It’s also found thatO2/Ar had remarkable effects on the phase-transition and optical properties ofVO2/VMoOX/VO2films. The optical transmittance will increase with increasing O2/Ar,and the semiconductor-metal transition characteristic will decline with increasing O2/Ar,when O2/Ar=5.0, the characteristic disappeared.2. The same method was used to prepare V2O5/Mo/V2O5film. According to theanalysis, molybdenum can restrain the growth of high-valence vanadium ions, and thesheet resistance was reduced by Mo-doping. Annealing can reduce the film’s defects, enhance the TCR of the film, but if the annealing time is too long, the TCR willdecrease then.On the basis of the above researches, preparation and characterization of thevanadium oxide doped with molybdenum were further acquainted and comprehended.And the results show that doping is an effective way to improve the properties ofvanadium oxide thin film.
Keywords/Search Tags:magnetron sputtering, VOx thin film, doping, sheet resistance, TCR
PDF Full Text Request
Related items