The Preparation Of Titanium Oxide Film And The Application Research Of The Optical And Electrical

Titanium oxide (TiOx) thin film has become a high-profile functional material due to its good thermal stability, chemical stability, wide band gaps, non-toxic, low cost, high refractive index and the excellent properties of convenient preparation.It can be widely used in catalyst, UV light detection, thermal material, solar battery, optical waveguide, gas sensors and other fields, especially its thermal characteristics has attracted much more attention. This paper, we focused on the optical and electrical properties of TiOx film from two aspects:experimental and theoretical respectively. TiOx film were deposited by dc magnetron sputtering system, studied the influence and contact of preparation condition on its thermal properties, optical properties and microstructure, mainly. The research content of this paper includes the following aspects:(1) TiOx films based on different substrate temperature, oxygen flow rate and annealing environment was prepared by the DC magnetron sputtering preparation.(2) The resistivity-temperature curve of the film was measured and the value of TCR was calculated by dc constant current source heating device, SX1934(SZ-82) type digital four-point probe tester and TES1310type thermometer. As the temperature of the substrate increases, the film’s TCR increases; The TCR value is also increase while the oxygen flow increased. The sputtering time and the annealing also show a very big effection on the value of TCR.(3) Film contents, carrier concentration and mobility was tested and characterized, Using the X-ray photoelectron spectroscopy (XPS) and the hall effect tester (HEM),it is found that as sputtering oxygen flow increases, the oxygen and the titanium elements ratio increases, the carriers concentration decreases, and the transfer rate also increases.(4) The optical constants of the film was obtained with SENTECH SE850-spectroscopic ellipsometry, the incident Angle is50°, test wavelength ranging from300nm to800nm, using the cauchy model to test results for fitting. It was found that with the increase of substrate temperature, the refractive index n and the extinction coefficient k increase; when the substrate temperature increases from150℃to250℃, the optical band gap of the film reduce to3.02eV from3.46eV; With oxygen flow increases from5sccm to15sccm,efractive index n and the extinction coefficient k were decreased, the optical band gap of the film increases from3.26eV to3.41eV.