Research On Cobalt Silicide Process Improvement

Now, Metal silicide has became more and more important for VLSI/ULSI device manufacture. It is widely used in source/drain and gate contact. The salicide process (self-aligned silicide) has became one of the key process of ultra speed CMOS logic device manufacture.This article induces the process of metal silicide and analysis the silicide related RC and yield status, and gives improvement plan.