The Key Technology Research Of Laser Direct-write System Based On DMD

With the rapid development of microelectronics technology andoptical communication technology, the urgent requestment for device'sminiaturization, lightweight and integration has greatly promoted thedevelopment of microfabrication technology. TheMicro-electromechanical System, which is based on Microelectronics,micromechanical, is combined with micro-optics to produce a new typeof technology system——MOEMS (MOEMS,Micro-optoelectromechanical System). Because the system has highintegration, low cost and excellent performance characteristics, it hasgreat competitiveness on information, military, aerospace, medical,industrial and other high-tech areas. Nowadays, the MOEMS includeslight modulator; disc read head, optical switch, optical attenuator, opticalscanners and spectrometers in the world. Among them, the DigitalMicromirror Device (DMD, Digital Micromirror Device), as a kind oflight modulator,has been widely used in projection area. As DMD hashigh resolution, fast response and efficient light energy utilizationcharacteristics, it can be applied to lithography system. The system which is described in this thesis is applying DLP technology whose featuresinclude: high pixel resolution and highly efficient lithography. If you usepoint by point lithography equipment in speed of1,000points per secondto photoetching area of500×500image, it will take4minutes. If youuse the point by point laser lithography equipment in speed of100pointsper second to photoetching area of500×500image, it will take42minutes. General lithography equipment only has the lithography speedof less than30points per second. It means that take more than two hoursto photoetching a same size image. The time of the DMD plane arraylithography is mainly determined by the number of image color,256-color images up to photoetching256layers. Then, it will only take afew minutes to complete the lithography by3seconds of exposure. Thissystem is suitable for high-precision and small area image lithography.I designed the lithography system which is based on the DLPtechnology in the thesis. It analyzes and studies the system design and itsbasic characteristics. The system as a maskless lithography technologywill be used to produce high resolution digital holographic images,miniature word lithography and other applications with a wideapplication prospect. Therefore, the research on drive control andsoftware control technology to the DLP technology helps playing thecentral role of the DMD device in the system more efficiently. It has veryimportant significance in the future improvement of the system. At the same time,these key technology researches as the system developmentbuilding in the process must be solved. I analysed and studied thedevelopment of the technology process and the technical principle of theabove three key technologies in the thesis. Then, the thesis presents thedesign requirements, the implementation process and design results aboutthe three key technologies. At last, I also chose specific application andcompares actual results about the three key technologies. Through theanalysis of the DLP technology, I design a feasible drive control circuitand interface circuit in order to realize the DMD reset and flip thesequential control function. I code the lithography control softwareaccording to the practical lithography requestment. In the research on thedevelopment process and the Fresnel lens optical characteristics of thescheme are compared, finally take the Fresnel lens homogenizationscheme, and choose proper parameters. In addition, the homogenizationof laser and the projections of laser beam tests verify the effectiveness ofthe module design. The analysis and research solving the keytechnologies of this system as above can make the laser lithographicsystem work well. Finally, I get the high word only for86microns bytrying photoetching miniature word. It also confirmed the system'sprecision, feasibility and effectiveness.The thesis, which is from the practical application, combining withthe field application technology at company and abroad, scientific research units shall bear the research content, my professional researchdirection, the key technology of lithography system analysis and research,has solved the key problems: laser beam expander after thehomogenization of plastic design technology; Digital Light processionchip units drive control technology, and software control design.Successful commissioning the system, the thesis shows that theexperimental results. DLP drive control circuit design is about to developlaser miniature display the DLP projects with a quite value of technicaldata and experimental data, is the enterprise application for the projectabout DLP technology. This is our institute first time to apply tophotoetching miniature word after the laser treat with Laser technical. Itgot an excellent effect. It is a valuable technology matting in futureapplication for digital holographic anti-counterfeiting technology researchprojects. Lithography software control is due to the purpose of thespecific needs. As it is developed by the project team independently, itcan be applied to other DLP lithography and display projects in the future.The results of the thesis are valueable not only to the researcher'spersonal ability improvement, but also to the scientific research work ofthe enterprise.