Preparation And Optical Properties Of ZAO Thin Film By Reaction RF Magnetron Sputtering

In different condition, the preparation, structure and optical properties of ZAO films prepared by RF-magnetron sputtering were studied.The structural characteristics, application development of ZAO film by RF-magnetron sputtering and the principle and characteristics of Magnetron sputtering were introduced. In our experiments, we observe the properties of the ZAO films through changing the process parameters of the experiments. It is founded that the orientation and the crystallization are more outstanding when the parameters are 200℃,90W, argon oxygen ratio 1:3. When ZnO was doped by aluminum, grain size of the films become small, the conductivity of ZAO film is more better than the films which is not doped by Al.We mainly discussed the optical electrical properties of the ZAO films. The influence of argon oxygen ratio, substrate temperature, sputtering time for ZAO film were discussed. Through a lot of experiments of testing the nature of ZAO films, the excellent preparation parameters were determined, and we got better properties films, and these provided the theory basis and the reference value for the application of ZAO films in the material field of TCO films.