The Eloectro-Optical Property Of TiN_x Films Prepared By Magnetron Sputtering

The titanium nitride is a semiconductor with wide band gaps structure mixed by ionic bonds, covalent bond and metallic bond, whose structure determines its superior performance, like high temperature resistance, corrosion resistance, high hardness, chemical stability and so on, mainly used in industry, decoration industry and electronic industry etc. Its main optical properties are two-fold:high reflecting near infrared and translucent near visible spectrum, these performances accord with the requirements of low radiation and energy saving glass, therefore the study of titanium nitride photoelectric performance become more meaningful. The preparation method of titanium nitride is varied, such as a chemical vapor deposition, ion plating, etc. This paper adopts both the traditional DC magnetron sputtering method and improved energy filtering magnetron sputtering two methods researched the photoelectric performance of titanium nitride film, mainly divided into two partsThe first part, adopting DC magnetron sputtering coated titanium nitride films on glass substrate. Then the influence of Temperature, nitrogen argon ratio and pressure on film photoelectric performance were researched. Get the best process parameters of preparation.(1)Influence of temperature on film photoelectric performance:The results of the study show that, with the rise of temperature, the film transmittance and reflectance near infrared have improved, and at high temperature the film has good crystalline and the resistivity decreased.(2)Influence of nitrogen argon ratio on the photoelectric performance of the film: With nitrogen argon ratio reduced, the transparence of film has dropped, the decrease of nitrogen content result in the content of titanium in film increases and the freedom multiplied carriers the resistivity declined.(3)Influence of pressure on film photoelectric performance:with the increase of the pressure, due to the increase of the colliding response gas, resulted in the kinetic energy helped titanium arrived the surface of substrate decreased and the deposition rate reduced, eventually leading to increase the transmissivity, but the reflectance, resistance and thickness are decreased.The second part, using the improved device, that is the energy filtering magnetron sputtering, studied the photoelectric performance of film.Influence of energy filtering magnetron sputtering on film photoelectric performance:experimental results show that, using the energy filtering magnetron sputtering, improved the bombardment of surface roughness for reduced the ion bombardment to the substrate surface, improved the roughness of the surface, made the film more density, grain size thinning and defect reduces and improved film optical properties.