Consider The Quantum Effects Of The Mosfet Device Modeling And Validation |
Posted on:2008-06-19 | Degree:Master | Type:Thesis |
Country:China | Candidate:L T Dong | Full Text:PDF |
GTID:2208360215966534 | Subject:Microelectronics and Solid State Electronics |
Abstract/Summary: | PDF Full Text Request |
CMOS IC follows the Moore's Law all along.The feature size of CMOS device is reduced into nanoscale regime at the first decade of the 21st century. Research on the nano-scale CMOS device faces the technology complexity and physics limitations. An accurate yet concise MOSFET device model is the key basis for a CMOS IC design tool. A method for self-consistent numerical algorithm of the Schrodinger's and Poisson's equations is proposed. A 1-D threshold voltage model is presented. By taking quantum-effects for short-channel into consideration, a 2-D quantum-modified threshold-voltage model is developed by solving the quasi-2D Poisson's equation. In order to verify the validity of the model, we conduct a parameter-extraction (PE) experiment numerically. We extract the DC parameters from a suite of different W/L devices under a certain technology condition. Then we simulate a digital circuit use the new extracted DC parameters. A good agreement between the model and the simulated results is obtained. The modeling and simulation method proposed in the paper may be adapted in research and development of nano-scale device and integrated circuits. |
Keywords/Search Tags: | MOS device, quantum - correction, surface potential, parameter-extraction |
PDF Full Text Request |
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