Large Field Of View Projection Lithography Objective Of The Study

Lithography is the most important technics when manufacturing of Large Scale Integrate Circuit. The lithography lens is the core of the lithography, whose capability determines the transfer capability of the pattern directly. The large field projection lithography lens is the one direction on researching and developing of the lithography lens, which is used for manufacturing the printed circuit of large area and high resolution, it puts an high demands on the design and process both for mechanical and optical. In this paper, the background of the lithography lens is represented firstly, the status of lithography lens' developmenttrend is described in terms of the most important parameter-----resolution.The main work of the paper is the research on distortion measurement of the large field projection lithography lens. The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed. Base on this, the distortion characteristic of lithography lenses is analysed. By testing the resolution and distortion of this lenses, we found that the completed projection lenses reach the design specification.Moreover, based on the lithography lenses which can be used to exposure an 8 inch wafer by one step, we analyzed the various factors which may cause the image quality deterioration of the optical system especially for this type of lenses in this paper, by ZEMAX simulation we get the result of the lens design, and more, we set the tolerance both for optical parts and mechanical parts, also the procedures of the adjustment and assembly for the whole lenses are described.