Si Based Sio <sub> 2 </ Sub> Arrayed Waveguide Grating Theory Analysis And Technology Preparation

As the optical communication developing rapidly, the AON (All Optical Net) is not merely a dream. The demand of the optical waveguide device is increasing day by day. The commercial environment surely will call for the performance improvement of the waveguide device. Besides designing, the process technic makes great impact on the device performance.This paper introduced the classification and differences of the thin film waveguide, rectangular waveguide and fiber. We briefly introduced the waveguide theory. We also analyzed the thin film waveguide from two different aspects: the radial theory and the wave theory, figured out the outcome of TE mode and TM mode of the waveguide.On the basic of waveguide theory, we studied the AWG principle and design process. And gave a design example of 16-channel 100GHz AWG.We have a good research of the manufacturing process of the arrayed waveguide grating (AWG) including film deposition, lithography, etching etc and explained the principle of every stage. We also explained the difference of hot oxide and CVD(chemical vapor deposition), wet etching and dry etching.According to the experiment condition of our lab, we explored the appropriate factor for every experiment stage, analyzed the influence of these factors between each other and obtain the optimize experiment factor. We measured the profile and surface roughness of the waveguide through SEM(scanned electronic microscope) and AFM(atomic forced microscope) and also measured the loss of the waveguide we made.At last, we summarized the series of fabrication process, made some advises to improve the performances of the optical waveguide device that we made. We also made a brief introduce of the foreground of the integrated optical waveguide device.