Plc Control Of Inductively Coupled Plasma Etching And Etching

In this paper,the development of Micro-system is explained. The present research of binary optics and the main methods for shaping are described and some kinds of the methods of etching are compared. The theory of ion etching and the parameter of ion source designing are discussed in detail. Hardware and software design for the Inductively Coupled Plasma Etching machine' s system are also presented. By using the technique of sidewall protection,the etch system can get high ratio height to width.Inductively Coupled Plasma Etching is a key technique for the transfer of the profile of binary optical components from photoresist to substrate. This paper has introduced the theory of Inductively Coupled Plasma Etching and investigated some empirical parameters of ion source design and the effect on the transfer of the profile of binary optical components by using diverse etching parameter. This paper has also investigated the etching velocity of different binary optical components at the same time.This paper describe the theory of PLC. Hardware of controlling is the S7-200 PLC from the company of Siemens. The S7-200 PLC has the digital controlling signals and the analog controlling signals. The S7-200 PLC is easy to be used for machine controlling.The software are written in LAD or the language STL and controlled by the developing software STEP7-Micro/WIN.