Computer-controlled Reactive Ion Etching And Etching

In the thesis, the development of Micro-system is explained, the present search of binary optics and the main methods used for take it shape are dictated, Some kinds of the method of etch is compared. The theory of ion etching and the parameter of ion source designing are discussed in detail. Illuminate the reactive ion beam etching machine's system of hardware, design of interface and software from the point of disigner'view. Device circuit to achieve multiplex D/A transition by using pulse-wild-modulate(PWM) technology.Reactive ion beam etching is a key technique for the transfer of the profile of binary optical components. This thesis has introduced the theory of reactive ion etching and investigated some empirical parameter of ion source designing and the affect of the transfer of the profile of binary optical components by using diverse etching parameter, has investigeted the etching velocity of different binary optical components at the same time.Hardware's interface electrocircuit and designing idea of the reactive ion etching machine is explained in this thesis. The basic idea for realizing the transfer from digital signals to analog signals and the choosing of eletrocircuit's parameter is introduced in this thesis also.Software can be assorted to two kinds: computer system and single-chip control system. Computer system's software is completed by C++ language, each control command is executed according on some time order, and check over time to time to enquire whether there has error to warning. Single-chip control system's software is completed by assemble language, use time interruption and external interruption to be import and export.