CIM Feedback Control System Design And Implement In Semiconductor Etch Area

The goal of this paper is to design and implement a system that use automation feedback control solution to improve the automation integration in semiconductor Etch area. The Semiconductor manufacture is one of the key fundament high technology industries. It is growing fast in the country. Base on the requirement of improve high productivity it generate the compute integration manufacture. Computer integration manufacture has a wide area in industries, especially in semiconductor. This paper is based on a practical project, focusing on each stage of Etch area process including Pre-Etch metrology, Etch, Post-Etch metrology. This paper has done a log of thorough researches, and put forward not a few new algorithms and implementations.On wafer metrology segmentation, this paper firstly examines the manually solutions shortage, and then points out the automation solutions to auto collect data. Then give the solutions including MES track in tract out, select recipe, upload metrology data. At last give the whole auto solution for select wafer and do the data reliability analysis. On Etch feedback control segmentation, this paper researches the Etch process in open line control. Point out that the pre-etch and post-etch data independent, the machine process error which cause the wafer yield below target. Then the paper use auto feedback control model to solve the issue.In this paper, not only auto feedback control system is successfully put forward and implemented, but also the methods are commonly helpful to other segmentation and recognition of semiconductor process area, in which lies the meaning of our work.