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Profile Control And Detection Of Multi-layer Dielectric Grating Masks

Posted on:2006-11-12Degree:MasterType:Thesis
Country:ChinaCandidate:H WanFull Text:PDF
GTID:2178360155467789Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
The fabrication of multi-layer dielectric grating masks is investigated theoretically and experimentally in this paper. The main contents are as follows:Firstly, the significance of the research on the inertial confinement fusion (ICF) and the progress of the research on the pulse compression gratings (PCG) are presented. The rigorous electromagnetic theory of diffraction gratings is introduced here. And the RCW (rigorous coupled-wave) method is adopted as the basic theory of numerical computation of diffraction efficiency.Currently, the holographic technique is the exclusive effective method to fabricate the pulse compression gratings (PCG). Since the holographic recording material (i.e. the material of the grating masks) used in this paper is photo-resist, the detailed researches are conducted in this paper to learn the luminous sensitive characteristics of it. The two factors (i.e. the developing time and the temperature of the developing solvent), which influence the luminous sensitive characteristics, are mainly analyzed in this paper. Based on this analysis, an effective method to control the profile of the grating masks is carried out.Development, which is the final working procedure of the grating mask fabrication, can make some compensation to the working procedure of exposure, so it has very significant influence to the profile of the grating mask. Owing to this, real-time detection in development is adopted to judge the changes of the mask by the variety of the diffraction efficiency of the incident light.Finally, a novel method to detect the profile of the multi-layer dielectric grating mask without any damage is put forward here. This method, based on the theoretical and numerical analysis by the RCW method, adopts the spectral distributing of the zero order diffraction efficiency to judge the gratings profile. Detecting experimentshave been conducted to compare the theoretical analyses. This method is proved to be effective to detect the grating mask profile to some extent. However, this method cannot tell the general characteristics of the grating mask because of quite a few unstable factors.
Keywords/Search Tags:gratings, the rigorous coupled-wave(RCW) method, luminous sensitive characteristics, diffraction efficiency, grating profile, detection
PDF Full Text Request
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