Rearch Of Mark-Detection And Registration In Scanning-Electron-Beam Lithographic System

After analyzing the mark signal of Scanning-Electron-Beam Lithographic System , it gives the scheme and block of backscattered electron detection circuit, also gives the result of the experiment. The paper summarizes how many kinds of distortion of e-beam field, exhibits the project and the flow chart of automatic-correction program about the linear distorti-on. The corrections to non-linear distortion of e-beam field is also pres-ented. Because the image of backscattered electron could reveal structure of the mark as well as the surface, we chose the backscattered electron signal to detect the position of the mark. The dual-half semiconductor detector is used. The backscattered electron detection circuit is compos-d of detector, analog-signal processing circuit, A to D convertor digital-signal processing circuit, computer and control unit. Some measues in the circuit design and PCB making to restrain noise is taken and illuminated in the paper in detail. In the paper, some kinds of distortion of e-beam field are summed up. We design the correction software in the base of detection circuit and patte-rn generator. The condition of the software is Windows XP and C language. In the program, the method involves noises controlling, duallizing, digi-tal-strong, and so on. Non-linear distortion is various and complicated , and the methods of correction are so many that it can be the target of deep research. At the last of the paper, the item's characteristic and the direction...