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Research On Thin Films Of Cr Mask Based On Glass

Posted on:2006-02-12Degree:MasterType:Thesis
Country:ChinaCandidate:F D WangFull Text:PDF
GTID:2168360152490328Subject:Fluid Machinery and Engineering
Abstract/Summary:PDF Full Text Request
Design and fabrication of Cr mask based on Glass in vacuum are explored theoretically and experimentally.On the basis of the underlying principles in the optical thin film design, by adopting the method of recursion, we get the mathematical model for the single layer absorption coating and the multi-layer coating, which have their characteristic reflectance and transmission changes, we use Essential MacLeod software to seek the best films to meet the required optical specifications.Numerous experiments and a series of testing have been carried out. The results indicate that the films are composed of Cr and O when using N2 or Ar. When controlling the overall pressure with N2 , Ar or O2, we get films different in variable microstructures, and Cr (110) and Cr2O3 (110) grow priority. Etching experiments proved that films have the best mechanical performance when Cr (110) and Cr2O3 (110) grow corresponsively.The studies suggest that the coating has excellent properties as the result of film design, and will be widely used in industries.
Keywords/Search Tags:Photo mask, Thin film design, Magnetic sputtering, Etching
PDF Full Text Request
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