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Study On The Characteristic Of Appearance Of Multilayer Dielectric Grating Mask

Posted on:2005-11-09Degree:MasterType:Thesis
Country:ChinaCandidate:K GengFull Text:PDF
GTID:2168360125966170Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
The fabrication of multilayer dielectric gratings is investigated theoretically and experimentally in this paper. The main contents are as follows:Firstly, the significance of the research of the inertial confinement fusion and the progress of the research on the pulse compression gratings(PCG) are presented. The electromagnetic theory of gratings is introduced in detail. Two methods (i.e. the method of FMM and the method of C) which are used generally have been chosen to be compared. Consequently, C .method is selected as the foundation of numerical computation.Owing to the holographic technique being the exclusive effective method to fabricate pulse compression gratings, the design and fabrication technique of the dielectric gratings are introduced in paper. At the same time, the difficulties about these two aspects have been analyzed, too.Finally, the novel method on detecting profile about multilayer dielectric grating is explored. By analyzing the numerical calculating results which based on the C method, a new method to estimate the profile of pulse compression grating with the detection of characteristic spectrum of diffraction efficiency on certain order is advanced. According to this notion, the measurement results of the multilayer dielectric grating are given andanalysis between experiment results and theory calculation are shown, too. The work would be the foundation of the following research about quality estimation and detecting of multilayer dielectric grating.
Keywords/Search Tags:pulse compression gratings, diffraction efficiency, C method, multilayer dielectric stack, detection
PDF Full Text Request
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