| I examine the theory and fabrication of lamellar multilayer x-ray diffraction gratings. I use current theory based on the Kirchoff Integral for amplitude gratings and a new equation for phase gratings to analyze current technology multilayer grating performance (where the period/{dollar}lambda{dollar} exceeds 10). I examine the possible fabrication methods and define two general categories (additive: multilayer added to patterned substrate, subtractive: grating etched into multilayer). I conclude the additive approach is superior, leading to x-ray analogues to binary optics and holographic optical elements. I define an additive process in detail and demonstrate the serviceability of the key processes: thermal growth of silicon dioxide on silicon, lithography, a combined plasma-etch and wet-etch. Multilayer fabrication difficulties on patterned substrates are identified, including: mushroom cap growth, and filleting in the grooves. Measurements done at NSLS on 2 amplitude gratings and 1 phase grating are reported. The data is shown to be compatible with the Kirchoff theory. |
