Reactive Magnetron Sputtering Of TiO₂ Thin Films And Study Of Oxygen Sensors

TiO2 oxygen-sensing material can be used in a wide range of applications. Properties such as low working temperatures, excellent quality, easily-preparation make them suitable to be used in food storage, check-up for exhaust gas of car, control of combustion process and purification of atmosphere. In recent years, TiO2 has become one of the most widely used oxygen-sensing materials in research and applications. TiO2 is known to exist in three distinct structures: two tetragonal phase for anatase and rutile and a third orthornombic phase for brookite. Rutile has the most stable structure and physical and chemical properties. In rutile structure oxygen cavities move quickly so that rutile has better gas sensing respond and become a chief material use for oxygen gas sensors.This paper discusses TiO2 thin films, grown on a glass substrate by DC reactive magnetron sputtering in a mixture of argon and oxygen. Variation in deposition rate of TiO2 films as a function of the flow of the O2 gas has been discussed. The influences of O2 partial pressure, substrate temperature and annealing temperature on the structural properties of the films have been studied. TiO2 oxygen-sensing film was prepared on a ceramic substrate by DC reactive magnetron sputtering.This paper designs TiO2 oxygen-sensing component testing circuit and temperature testing circuit. The simulated gas experimentation equipment tests characteristics of TiO2 thin film. Changes of resistance of the TiO2 thin film with flow of the O2 gas and Change of resistance of the thermistor with voltage of the heating circuit have been discussed.