Preparation Of Sputtering Targets And Thin Film Structure Characterization Of La And Ca-Doped PbTiO₃

(Pb_1-x-yLa_xCa_y) Ti_1-x/4O₃ (PLCT) thin films were fabricated by a radio-frequency (rf) magnetron sputtering technique. Brfore sputtering, we Successfully produced sputtering target, XRD,XRF and SEM were used to characterize the target. The results show that the performance of target is excellent. The phase compositions and structure of rf-magnetron sputtering PLCT films were studied by using wide angle X-ray Diffraction (WAXRD). The surface morphologies of thin films were observed by using scan electron microscope (SEM) and atomic force microscope (AFM). Based on grazing incidence X-ray diffraction (GIXRD) equipment, we find that residual stress exist in magnetron sputtering PLCT film, In addition, the ferroelectric properties of PLCT thin films were measured by Radiant Premier LC type multifunctional ferroelectric properties test system.In order to gained the films of different component ,we devise a new method about making target. Affix small target to big target, In sputtering, we can control the film'component through changing amount of small target.The investigation of structure by X-ray diffraction shows that Crystal parameters changes clearly when percenting Ca and La into PbTiO₃, It was caused by the Ca ion and La ion replaced the Pb ion of A position in perovskite compound, that bring lattice mismatch and asymmetrical replace. In the process of sputtering,The parameter of sputtering plays a crucial role in the texture of PLCT film, The experiments show that lower sputtering pressure and longer sputtering time is propitious to form"perovskite". Besides, we get further explaination on this phenomenon by AFM and SEM.The surface morphology of PLCT ferroelectric thin films was studies by AFM combined with other analysis techniques (for example SEM). It shows that the surface of PLCT thin films is rather smooth and continuous. The XRF analysis of PLCT thin films shows that the atomic ratio of PLCT thin films is closed the ideal chemical mole ratio of PLCT thin films.In the process of sputtering, it is important to characterize the thickness and residual stress of PLCT films.In experiment. Through the technology of X-ray...