Based On Atomic Force Microscopy Lithography Fabricate Nanostructures And Nanopatterns

Scanning probe microscopy (SPM) is one of the important tools for superficial analysis in recent years, which has been widely employed monitoring the surface and manipulation in nanotechnology field because its high resolution and ability of working in vacuum,atmospheric and liquid environment. As one of the most important tool in the scanning probe microscope, the atomic force microscope may carry out the morphology observation, the physical property survey and the nanometer operation in the atmosphere and the liquid environment for any materials, which has already widely used in the nanotechnology research.Based on the AFM mechanical lithography possesses many excellent features, such as a high machining precision, processing a widespread material and detecting the machining material. So the further investigations of AFM lithography may have a more important theoretical significance and values. There are many factors that affect the AFM mechanical lithography. such as normal force , scratch speed and the cycle number of scratch. In this thesis, we investigate the main parameters of scratching metal, insulator and semiconductor materials, and then select the appropriate parameters to fabricate nanostructure and nanopatterns. The main contents include as followed:First, Atomic force microscope (AFM) equipped with diamond-like–carbon (DLC) coated Si probe has been used for scratch nanolithography on Pt and mica surface. The effect of s applied tip force, scratch speed and number of scratches on the size of the scratched geometry has been investigated. And Complex nanopatterns are further fabricated on Pt substrate.Second, explored the potential of DLC-coated tip used as a cutting tool in AFM-based scratch nanolithography on silicon surface, The effect of scratch direction, applied tip force, scratch speed and number of scratches on the size of the scratched geometry has been investigated. Complex nanostructures of arrays of parallel lines and square arrays are further fabricated uniformly and precisely on Si substrate.Last, utilizing an atomic force microscopic, patterning is achieved via scratching lithography through a thin polymeric photoresist. Metal deposition proceeds on exposed portions of the substrate, and the resist is subsequently lifted off to yield the desired metallic features. The current–voltage (I–V) behaviors of a single metal nanodot showed rectifying characteristics by conductive-atomic force microscopy measurement. The ambient environment is likely to induce oxidation of Cu and then the typical Schottky barrier formed by Pt–nanodot-Pt.