H₂-N₂ Mixture Gascapacitive Rf Discharge Characteristics Of PIC/MCC Simulation

The increasing demand for higher throughput, larger processing areas, improved uniformity and film quality, coming from the semiconductor industry, has motivated a special investment in microcrystalline silicon. On the one hand, people are in-depth study of hydrogen rf discharge parameters and process status of the relation, understand the outside reason from the mechanism of the discharge parameters on the plasma state parameters; the other hand, through the incorporation of other types of gas trying to improve the discharge characteristics of hydrogen and enhance the activity of hydrogen ions. In this paper, Using a-hybrid and self-consistent PIC/MCC model, has calculated rf discharge characteristics of hydrogen and the hydrogen mixed with different ratios with nitrogen.to some extent, this article reveals the mechanism of hydrogen rf discharge, the specific work as follows,1.The establishment of a hydrogen rf capacitive discharge PIC/MCC mixed self-consistent model to simulate the discharge to reach steady-state spatial electric potential, electric field, charged particles (e, H+, H2+, H3+) of the density distribution, the average energy distribution and energy distribution. The results showed that:(1) pressure on the sheath have significant impact, as the pressure increased, decreased plasma space potential, the sheath thickness becomes smaller. (2) sheath visible near the electrode, there are strong sheath electric field, ions in the region accelerated by the electric field to the plate direction. (3) H3+ions at high pressure hydrogen ccrf discharge space is the main positive ion, H3+ions enhance the activity of the hydrogen discharge in the material play an important role in the application.2.Established a a-hybrid and self-consistent PIC/MCC model of H2-N2 ccrf discharge, addition of 0%-30% of nitrogen, simulation of the space electric potential, electric field distribution of charged particles (e, H+, H2+, H3+) of the density distribution, energy distribution after a steady state. The results showed that:(1) With the increase in the ratio of nitrogen-doped, bigger space potential, sheath thickness narrow, the corresponding electric field enhancement. (2) doped with nitrogen will e-collisions with the background gas while ionization and dissociation enhanced, electron density, electron energy decreased. (3) With the increase in the proportion of nitrogen doping would increase the average energy of hydrogen ions. The results for understanding the hydrogen ccrf discharge, hydrogen and nitrogen mixed gas ccrf discharge plasma provide the reliable basis.