Particle-in-cell Monte Carlo Model Of Capacitive Coupled Discharge

As its structure is simple and the cost is cheap,capacitive coupled discharge has been widely applied in many fields,such as plasma deposition,etching and plasma cleaning and so on.Especially in the semiconductor and micro-electric industry,capacitive coupled discharge is the dominant plasma sources.For there are so many particles and reactions involved in discharge,the discharge process is very complicated.The ordinary experimental diagnosis could only obtain few discharge parameters: electron temperature,electron density.It's difficult to obtain the interaction mechanism of discharge parameters.To further use the capacitive coupled discharge,two kinds of capacitive coupled discharge is simulated by one-dimensional PIC-MCC model.(1)Capacitive coupled oxygen discharge:Based on the simulation of capacitive coupled oxygen discharge,the time average potential profile,time average particle density and time average electron temperature were obtained.It can be found that,with the RF source voltage increased,the average density of particles,the width of sheath and the electron temperature all increased,while the distribution width of potential profile decreases.With the increasing pressure of gas,the average density of particles increased,the sheath width and the average temperature of electron both decreased,and the plasma potential profile didn't change much.With the increasing discharge gap,the time average density of particles increases slightly,the sheath width was the same,and the electron temperature decreased slightly.(2)Capacitive coupled argon discharge:With one-dimension particle-in-cell Monte Carlo model of argon capacitive discharge,the following phenomenon could be observed.With the increasing gas pressure,the time average density of particles increased,the time average plasma potential was almost the same,and the sheath width decreased.With the RF source voltage increased,the particles density and the distribution width of potential increased,and the sheath width decreased slightly.With the increasing discharge gap,the distribution width of plasma potential profile increased,while the density of particles and the sheath width were almost the same.