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Research On The PECVD Fabrication And Photovoltaic Performance Of Transparent Conductive AZO (ZnO: Al) Film

Posted on:2008-02-05Degree:MasterType:Thesis
Country:ChinaCandidate:Y P LiuFull Text:PDF
GTID:2120360272468274Subject:Pulsed Power and Plasma
Abstract/Summary:PDF Full Text Request
Solar energy is a clean renewable energy source, solar cells based on photovoltaic effect have broad bright future. And transparent conductive film technologies paly an important role in the research and production of high-efficiency,low-cost solar cell. AZO (ZnO: Al) transparent conductive films possess not only good photovoltaic properties like ITO (In2O3: Sn), but also lower prices, more nontoxic, more stable in hydrogen plasma environment than ITO.To obtain AZO film with high transmittance in visible light area, low resistivity, stable performance, high quality, good adhesion to the substrate, many AZO film preparation techniques have been developed at home and abroad to control and improve the material performance, such as magnetron sputtering, sol-gel, pulsed laser deposition (PLD), vacuum evaporation, Chemical vapor deposition (CVD) and others. In this thesis, AZO polycrystalline thin films with strong adhesion to the substrate, low sheet resistivity of 89, and high visible light transmittance of 89% have been fabricated by PECVD (plasma enhanced chemical vapor deposition) method on glass and silicon substrate. Main researches for this thesis are included as follow:(1) The structure, photovoltaic properties, fabricates technologies and applications of AZO film are introduced.(2) The reactor set has been designed, installed and debugged according to the principle of PECVD and the physicochemical nature of source material about Zn(CH3COO)2·2H2O and Al(OH)(CH3COO)2·4H2O.And the effects of the process time, discharge voltage and working gas on the electrode temperature have been investigated.(3) AZO (ZnO: Al) films have been fabricated. the corresponding basic properties have been tested and analyzed by FSEM, EDAX, XPS, XRD, ultrasonic, UV spectrophotometer and Two-sounding four-probe tester.(4) The effects of process parameters on the deposition rate of AZO, crystal structure, surface morphology and photovoltaic characteristics have been discussed.The purpose of this thesis is focused on the new development of AZO films fabricated technology with low cost, low power and high quality film. That AZO film fabricated by PECVD is an edificatory attempt.The results obtained are very useful for reference to the choice of actual process.
Keywords/Search Tags:AZO (ZnO: Al), Transparent conductive films, PECVD (plasma enhanced chemical vapor deposition), fabricate, Process parameters, photovoltaic Properties
PDF Full Text Request
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