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Research Of Focus Optical System Used In Ultraviolet Photolithography

Posted on:2008-07-25Degree:MasterType:Thesis
Country:ChinaCandidate:Q WangFull Text:PDF
GTID:2120360215489771Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
Optical photolithography is always a mainstream technology for micro-processing technology, it's the key point of which many countries research on recently. Based on the investigation of world optical photolithography technology development and progress, and the target to satisfy the application demands of the High schools, universities and institutes and so on, this paper studies on one kind of focus optical system used in ultraviolet photolithography which takes advantages of low price and simple structure. This work has both theory significance and urgent demand background.Based on the understanding and analysis of typical photolithography methods, the transmission and reshaping characteristic of spherical wave, as well as the focal point shift of the optical system and so on were all described in detail in this paper, Then, this paper proposes a novel design of scanning photolithography which has gathered respective merit of the electron beam photolithography and the optical photolithography. The design, analysis and simulation of the focus optical system used in ultraviolet photolithography system are performed with a special consideration on optics; The key technologies such as drive electric circuit, optics coupling manner, light beam focusing system are systematically explored, at last the testing platform is established, and the experimental adjust, test, and analysis are carried on.This paper is focused on the following aspects:1. Based on scrutinizing and analyzing the literatures, analyzes the latest development in the area of micro-processing, especially the development and present state of the photolithography.2. Compares with several kind of ultraviolet photosources, chooses the appropriate one, and carries on the simulation design and the experiment on its drive electric circuit.3. Thoroughly compare and analyze the characteristic of the spherical wave and the Gauss light beam, carries on the detailed analysis and design on optically coupled system and the light beam focusing system4. Carries on the correlation optical experiment, analyzes and discusses on the experimental result.
Keywords/Search Tags:Ultraviolet LED, Optical photolithography, Lens, Focus
PDF Full Text Request
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