Research On Equipment Model In IC Technology Simulation

A equipment model of ion implant which thinks over the channel effects is established in This paper and it displays ion implant process result on silicon chip with Visual Basic programming. The main achievement is: (1) establish the simulation database in all implant condition by simulation experiment. (2) realize the function of database sorting and seeking. (3) simulate the uniformity of ion implant process on a chip by Visual Basic.In second part of this paper, Singular point Splitting Algorithm which can simulates the etch profile is set up by Visual C++. The main achievement is: (1) establish the Singular point Splitting Algorithm model which can simulate the etch profile, it improves the simulation algorithm of etch profile and has a quite meaning in veracity of etch profile simulation. (2) analyze the SEM photo of etch profile and explain the experimental support and advantage of Singular point Splitting Algorithm. (3) base on the Singular point Splitting Algorithm, we simulate the etch profile with Visual C++ and display the profile graphic.In the last part of this paper, equipment model of etch is established by neural network toolbox in Matlab. The main achievement is: (1) select the cascade forward neural network as the basic neural network model in etch equipment simulation and optimize the architecture and the transfer functions of neural network. (2) input the etch equipment parameter and the process results to train the neural network, then gain the neural network model of etch equipment. (3) simulate the etch rate on a chip by the trained neural network model.All the research combines the IC technology control with the neural network, achieves the equipment model in IC technology, enriches the simulation model in the field of TCAD.