| The metal insulator semiconductor (MIS) structure is arguably the most technologically important type of solid in existence. The microelectronics revolution of the last thirty years is made possible largely due to the ability to realize extremely high quality metal/SiO;In this thesis, MIS structures incorporating two high-mobility semiconductors, GaAs and Ge, are investigated. An in situ, plasma-enhanced chemical vapor deposition system has been constructed which allows deposition of Si-based insulators and group IV semiconductors on the pristine GaAs or Ge surface.;For the GaAs MIS system, a thin Si/Ge interlayer between the insulator and GaAs surface is found to improve the insulator/GaAs interface. This has allowed the realization of high transconductance GaAs metal insulator semiconductor field effect transistors (MISFETs).;For the Ge MIS system, the growth of Ge on GaAs at 250... |
