Iron silicide formation, by thermal reaction of Fe-Si thin film and bulk diffusion couples, has been systematically studied. The bulk diffusion couple work involved the construction and annealing of diffusion couples made from pieces of pure Fe and single crystal Si. Annealing was done at 600, 637, 666 and 700;In thin film diffusion couple work, silicides were characterized by transmission electron microscopy (TEM) with EDS. An oxide layer and off-stoichiometric Fe;In order to better understand Fe... |