| A thin-film coated catalyst reactor was used to investigate the gas-phase photocatalytic oxidation of toluene over two semiconductor catalysts, titanium dioxide and an 8% silica-titania binary oxide. When this reactor was used two reaction regimes were observed: the bulk transport regime and the surface controlled reaction regime. The surface reaction controlled regime was of most interest since mass transfer effects are eliminated.; Experiments performed using both catalysts under study showed that the SiO2-TiO2 binary oxide is more active and deactivates at a slower rate than the TiO2 catalyst. Loss of activity for both catalysts was due to poisoning with a first order poisoning decay rate. Fitting the experimental data to this model enabled the prediction of the toluene initial conversion.; A suitable model that could predict the reaction kinetics adequately was not found. The dependence of the reaction rate on toluene initial concentration gave an order of 0.3 for SiO2-TiO, with a rate of reaction constant (k) of 3.1 × 10–1 kmol 0.7-m/(kg-h), for a concentration range of 50 to 150 ppmv. This suggested that some toluene adsorption was taking place over the catalyst surface. The reaction rate for the TiO2 catalyst was apparently zero order for the 50 to 100 ppm concentration range. The value of k obtained for this catalyst using this model was 4.5 × 10–4 kmol0.9-m0.3/kg-h.; Gaseous products encountered for this reaction with both catalysts benzaldehyde, carbon monoxide, carbon dioxide and water. |