Controlled deposition of nano particles

The new generation of electronic devices using nano materials is an emerging field. Nano particles, owing to their unique physical and chemical properties are much sought after in optoelectronics, quantum devices, sensors, and in many biological applications. Fabricating these devices require precise and controlled deposition of the desired nano particles which is a complicated process.;This thesis studies the parameters involved in having control over the deposition of nano particles, and discusses control over physical vapor deposition process as well as electrochemical deposition processes. In the PVD process, a quadrupole mass filter (QMF) is used as a band pass filter to filter out size selected nano particles from an incoming beam of sputtered nano particles consisting of both neutral as well as charged particles with wide size variations. The QMF electro statically manipulates and filters the size selected charged nano particles. Other factors like deposition time and gas flow rate are also studied. In the electrochemical process, thin film anodized alumina is used as a substrate to deposit nanoparticles. Various parameters like pH, deposition potential and deposition time are analyzed to gain control over the process. A working combination of these parameters for a specific type of deposition is experimentally verified.