Analysis And Improvement Of Photoresist Peeling On Color Filter

Color filter is one of the three key components in TFT-LCD,which directly determines the color image quality of the display.The core of the color filter technology is the photoresist material.Its quality and performance are the key factors that affect the display performance,yield and reliability of the display.The photoresist material is a photosensitive material.When exposing,it is necessary to select the exposure spectrum and exposure energy that match the material.Otherwise,the problem of photoresist peeling issue may be encountered,resulting in pixel defects,light leakage,bright spots and so on.The problem of photoresist peeling issue under current technology is difficult to solve.At present,the photoresist used by CSOT is supplied by several manufacturers such as Toyo ink,JSR,DNP,TOK,CMC,SMK,etc.,all of which have the probability of peeling issue.The universality of the problem can be seen.The pixel highlights caused by peeling issue are difficult to repair,which leads to the problem of product degradation,which causes great loss to actual production,so it is necessary to study the problem in depth.In this thesis,the composition and mechanism of photoresist materials are firstly studied and analyzed,and the causes of defects in the application of photoresist are discussed in depth.Then,the performance of the photoresist peeling issue and the influence on the image quality in the application process are analyzed,and the causes,influence factors and proportion of the peeling are deeply studied.Finally,through the experimental analysis of the product manufacturing process and the use process,an effective peeling improvement method is found from both the material and the process.And establish a peeling feature detection model to guide actual production practices,improve product yield and reduce production costs...