Experimental Research On GaAs Celt Processing Based On The Adjusting Of The Electrode's Voltage

With the development of optical components and high-speed integrated circuits,the development of semiconductor manufacturing processes has important implications for the development of future microelectronics technologies.Confined Etchant Layer Technique(CELT)is an effective method for processing GaAs,which has many advantages such as no residual stress and no secondary surface damage.Since its introduction,there have been in-depth studied on the concentration,ratio,and working distance of the static confinement etching of the CELT technology.However,further research is needed on the research of the machining method based on the electrode's voltage modulation.In this paper,the finite element analysis software is first used to simulate and analyze the machining principle based on the electrode's voltage modulation.Based on the existing electrochemical theory,the relationship of several parameters such as the electrode's voltage,the electrode's current and processing depth are established.On this basis,the static and dynamic etching experiments based on the electrode's voltage adjustment were performed,and the specific equation of the Boltzmann relationship between the electrode's voltage and the machining depth was obtained.It is concluded that the integrated value of the electrode's current is proportional to the machining depth.At the same time,the sinusoidal surface processing based on the theoretical formula is performed by using the function relationship between the electrode's voltage and the machining depth.After analyzing the machining results,the machining parameters were optimized,and the machining results after optimizing the machining distance and machining time were obtained.A processing method based on current modulation is proposed to solve the problem of machining depth error due to passivation phenomenon in the theoretical formula and parameter optimization process without reducing the resolution.And using the optimized parameters to process the complex surface through the current modulation method,a better complex surface is obtained.However,there are defects such as distortion and low resolution in the processing results.Further exploration and research are needed for this method.