Design Of Infrared Reflector And Antireflection Lens Film System And Study Of Its Space Ionization Effect

In this paper,two all dielectric mirrors of reflector and antireflection lens with a central wavelength of 1064nm are designed by using optilayer software.The variation of the mirror spectrum with the thickness of the dielectric film and the refractive index error of the film material is analyzed.Using the space radiation effect simulation equipment,the radiation simulation test of GEO orbit charged particles was carried out on the actual plated samples.The spectral change rule of the lenses after irradiation was summarized and the mechanism was analyzed.In the process of film system design,quartz glass and sapphire are selected as the substrate,HfO2 as the high refractive index material and SiO2 as the low refractive index material.After design and optimization,"air/2LH(LH)16/sub"structure is adopted for reflection film system,and "non ?/4-non ?/4" double layer scheme is adopted for antireflection film system finally.The theoretical reflectance and the theoretical transmittance of the mirror are above 90%,but the measurement of the actual plated sample shows that the spectrum of the actual sample is lower than the theoretical value.Theoretical calculation shows that when the thickness error of each film in the film system is the same,the spectral curve of the mirrors will shift,and the spectrum of the film thickness increases to the right,and vice versa;while when there is random film thickness error in the film system,the spectrum of the mirrors will not change in 1064nm accessories,and the spectrum change in other bands is more complex.When there is an error in the refractive index of the thin film material,the spectrum of the mirrors drifts,the refractive index increases,the spectrum shifts to the right,and vice versa.The equivalent simulation test of 15 year dose irradiation of GEO orbital charged particles on the samples shows that the effect of charged particles irradiation on the infrared spectrum of HfO2/SiO2 film system is very small.The peak reflectivity near 230nm of quartz glass and sapphire reflectors decreased by 31%and 26%,respectively.However,the transmittance of the two antireflection lens decreased by 29%and 13%respectively.The change of the spectrum of the mirrors are mainly caused by the irradiation coloring of the material.The number of different kinds of color centers determines the change of the spectrum in the corresponding absorption band.According to the theory of color center,the absorption spectrum of the antireflectors shows that there are four main absorption peaks of 206nm,412nm,245nm and 289nm,which correspond to the E' center and NBOHC center of SiO2,Pb0 center and Pbi center of HfO2,respectively.