| As a traditional structural ceramic material,silicon nitride(Si3N4)ceramic material has many excellent mechanical,physical and chemical properties and is widely used in automotive,metallurgy,aerospace and other fields.At the same time,Si3N4 ceramic has high theoretical thermal conductivity and is considered as one of the most promising alternative materials for electronic packaging ceramic substrates.The preparation of high quality Si3N4 ceramic powder is the basis for the preparation of high performance Si3N4 ceramics.The major problem in the preparation of Si3N4ceramic powder is how to obtain Si3N4 ceramic powder at low temperature.In this paper,the effects of raw material,graphite paper substrate,nitridation gas,nitridation temperature,nitridation time and catalyst on nitridation process and phase composition and microstructure of the product were studied.The catalytic mechanism of metal oxide was also studied.The results are as follows:The optimum nitridation experimental parameters were:micron Si as raw material,nitrogen-hydrogen mixed gas as nitridation gas,and graphite paper as substrate.When the catalyst content and the nitridation time were constant,the degree of nitridation increases as the temperature increased.When the catalyst content and the nitriding temperature were constant,the degree of nitridation increased as the holding time increases.Nitriding experiments were carried out using Cr2O3 as a catalyst,and the degree of nitridation increased with the increase of Cr2O3 content.The Si powder with 2.5-8wt%Cr2O3 was completely nitrided at 1350℃for 2h.The main crystal phase of the sample wasα-Si3N4,the secondary phases wereβ-Si3N4 and Si2N2O.The Si powder with 2.5-8wt%Cr2O3 was nitrided at 1400℃for 4h to obtain pure Si3N4 powder with the main crystal phaseα-Si3N4 and a small amount ofβ-Si3N4.Cr2O3 promoted the nitridation of Si powder by mutual conversion with Cr2N,and mainly promoted the conversion of Si toα-Si3N4.TiO2 was used as the catalyst for nitridation experiments.At 1300℃,the addition of TiO2 inhibited the nitridation of Si.At 1350℃,with the increase of TiO2 content,the degree of nitridation increases and theβ-Si3N4 phase increased.The samples with 2.5-8 wt%TiO2 achieved complete nitridation at 1400℃ for 2h and the main crystal phase wasβ-Si3N4,the second phase wasα-Si3N4,and the impurity phase was Si2N2O.Unfortunately Si2N2O could not be removed with increase of the nitridation time.TiO2 promoted the nitridation of Si powder by mutual conversion with TiN,and mainly promoted the formation ofβ-Si3N4 phase.The catalytic nitridation mechanisms of the two catalysts were similar,but the specific catalytic temperature,the temperature of complete nitridation and the main crystalline phase of the final product were different.This was related to the stability of the metal oxide,the more stable the metal oxide was,the more difficultly the metal oxide was reduced. |